: : : :::: Coax Group Corporation LTD. :::: : : :

::Sample Preparation::

CARBON COATER K450
· Full automatic control
· Automatic protection shutter
· Reproducible coatings
· Even thickness deposition over a range of coatings using string or cord
· Restricted vent control avoiding specimen disturbance
· Spring loaded 'quick load' electrodes
· Modular control electronics

SPUTTER COATER K550
· Full automatic control
· Low energy 'cool' system
· Low voltage sputtering
· High resolution fine coating
· Precise reproducible coating
· Even thickness deposition

CARBON COATING ATTACHMENT K250
· Reproducible coatings
· Even thickness deposition over a range of coatings using string or cord
· Spring loaded 'quick load' electrodes
· Modular control electronics

TURBO SPUTTER COATER K575
· Full automatic control
· Ultra high resolution (less than 0.5nm Chromium grain size)
· Thin film deposition (Typically 5nm)
· Turbo molecular pumping system
· Modular control electronics

LARGE SAMPLE COATER K650
· Full automatic control
· High resolution fine coating
· Precise reproducible coatings
· Even thickness deposition
· Modular control electronics
· Rotating specimen stage 155mm Dia
· Triple target sputtering

TURBO LARGE SAMPLE COATER K675
· Fully automatic control
· High resolution fine coating
· Precise reproducible coatings
· Even thickness deposition
· Rotating specimen stage
· Multi target sputtering
· LCD status/data entry display
· Active vacuum gauge head
· Turbo molecular drag pump
· Peltier cooled targets-no water

TURBO FREEZE DRIER K775
· Liquid nitrogen fed cold stage
· Vacuum gate valve to chamber
· Vacuum specimen transfer chamber
· Accurate time and temperature monitoring
· Modular electronics

CRITICAL POINT DRIER K850
· Vertical chamber with top filling and bottom draining
· Normal operating temperature 35°C pressure 1500 p.s.i.
· Adiabatic cooling and thermoelectric heating
· Fine control needle valve pressure letdown with flow gauge monitor
· Illuminated chamber with side viewing port and protective 'lexan' shield
· Stirrer system for enhanced solvent exchange
· Temperature monitoring and control with thermal cut-of protection
· Pressure monitoring with pressure relief valve and rupture disc protection

TURBO EVARPOLATOR K950
· Automatic pumping sequence
· Turbomolecular pumping
· Clean vacuum
· Evapolation pulse button
· Restricted vent control avoiding specimen disturbance
· Rotating specimen table

HIGH VACUUM TURBO EVAPORATOR K975
· Variable outgas control
· Unique 'anti stick' carbon rod gun assembly
· Rack out drawer sample loading system
· Rotating plate specimen table, with external accurate tilt control
· Large sample holders, range of options, including grid holders, stub holders
· Selectable evarpolation supplies giving x4 evarpolation settings
· Sputter coating (option) for range of metal targets
· Film thickness measurement for carbon & metal depositions

CRYOGENIC PREPARATION SYSTEM K1250
· Independent preparation system
· Liquid nitrogen dewar for preparation chamber with long term stability
· SEM cooled stage with temperature and timed sublimation heater
· Liquid nitrogen dewar for SEM with long term stability
· SEM gate valve to facilitate efficient transfer
· Modular electronics. Full push button and automatic. Full push button and automatic control of pumping and valve sequence

Model 691 Precision Ion Polishing System (PIPSTM)
The PIPSTM is a "user friendly" precision ion polisher designed to produce high quality, TEM specimens with minimal effort.
· High milling rates at shallow angles.
· Penning guns having no consumable parts.
· Patented Whisperlok TM for fast and simple specimen exchange.
· Patented specimen holders for double sided, low angle milling.
· Beam Modulation offering both single and double sector milling.
· Combined feature set eliminates the need for a Cold Stage.
· CCD imaging system for real-time video imaging. (Optional)
· Chemically Assisted Ion Beam Etching (CAIBE), greatly improving the thinning of semiconductor materials. (Optional)

Model 682 Precision Etching Coating System (PECSTM)
The ideal instrument for any application requiring sample cleaning or etching followed by high-resolution sputter coating. The PECSTM is unique ion beam based etching and sputter coating system producing exceptionally large, clean, viewable areas of specimens for Scanning Electron Microscope (SEM), Transmission Electron Microscope (TEM) and Light Microscope (LM) applications.

FB-2100 Focused lon Beam System
Hitachi model FB-2100 allows rapid and precise specimen preparation for both transmission and scanning electron microscopy of semiconductors and other advanced
- Accelerating voltage : 1040 kV
- Maximum beam current : 30 nA at 40 Kv
- Maximum beam current density : 25A/cm2 at 40 kV
- Image resolution : 6 nm or better at 40 kV

Q150R Series
Q150R S - Rotary pump sputter coater, suitable for coating specimens with non-oxidizing (noble) metals,
such as gold, silver, platinum and palladium.

Q150R E - Rotary pumped carbon coater, which uses carbon fibre or carbon cord to coat SEM specimens.

Q150R ES - Combines capabilities of both the Q150R S and Q150R E in one space saving platform.
The dual purpose, cmpact, rotary pumped system is supplied with sputtering and carbon fibre evaporation inserts-offering unequalled versatility of use.